Sputtering system using Magnetron

Sistema de pulverización catódica (sputtering) mediante Magnetrón
  • Reactive sputtering system with circular magnetron
  • Porta substrates with control and temperature measurement up to  950ºC
  • Portables substrates with capacity for samples up to 7cm in diameter (about 3 inches).
  • System dedicated exclusively for the synthesis of piezoelectric material based on nitrides (AlN y ScAlN)
Here you can download the SERVICE APPLICATION FORM