Institute for Optoelectronic Systems and Microtechnology
Universidad Politécnica de Madrid


Departamento de Ingeniería Electrónica

Departamento de Electrónica Física

Departamento de Ingeniería Química Industrial y Medio Ambiente

Escuela Técnica Superior de Ingenieros de Telecomunicación

Escuela Técnica Superior de Ingenieros Industriales

Universidad Politécnica de Madrid


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The services presently available at CT-ISOM correspond to the Research lines developed at ISOM with the current available facilities, according to the following scheme:
    • Joule evaporation deposition (Au, AuGe, AuZn, Ni, etc)
    • e-beam evaporation deposition (Au, Pt, Ti, Al, etc.)
    • Chemical Vapour Deposition (CVD) for isolators (Si-O-N systems)
    • Sputtering for magnetic materials (Fe, Ni, Co, FeNi, etc..)
    • Molecular Beams Epitaxy (MBE) for semiconductors (AlGaInAs and AlGaInN families)
    • Electrodeposition of Au, Ni, CoP, etc.
    • Air-bridge contacts fabrication
    • Lithografy
      • E-line nanolithography (line resolution > 10 nm)
      • Electron beam lithography (EBL) (resolution > 300 nm)
      • Photolithography (resolution > 1 micron)
      • Optical Mask design
    • Chemical, Thermal and Mechanical Treatment
      • Cleaning (Organic, acid chemicals...)
      • Polishing (machine and hand)
      • Precission cutting
      • Reactive Ion Etching (RIE)
      • Wet Etching
      • Standard Thermal Annealing
      • Rapid Thermal Annealing (RTA)
    • Soldering and packaging
      • Soldering
      • TO-5 Packaging
      • TO-8 Packaging
      • Other Packaging
    • Optical Characterization
      • Sample preparation for measurements at both low and room temperature
      • Photoluminescence (PL) measurement (IR-VIS-UV), at temperatures within the range 10-300K
      • Electroluminescence (EL) measurement
      • FTIRS measurement (600 nm-20 microns)
    • Optoelectronic Characterization
      • Device Preparation
      • Spectral responsivity for detectors measurement (from 12 micron to 200 nm)
      • Spectral laser emission measurement (from 600 to 1700 nm)
      • Spectral luminescence emission measurement (from 200 nm to 2.5 micron)
      • L-I curves in UV-VIS-IR lasers
    • Electrical and Magnetical Characterization
      • Resistivity measurements, room temperature
      • Hall measurement, variable with temperature (100-300K)
      • C-V and I-V measurement at room temperature, as well as temperature and frequency dependence
      • Hysteresis Cycles for thin films
    • Microscopy and Structural Characterization
      • Thickness measurements in thin films and surface measurements
      • Contrast microscope photograph (electronic file) and polarization
      • Sample preparation for SEM measurements
      • EDX characterization with SEM, with reference
      • Surface characterization by SEM
      • AFM and MFM Characterization
      • X-Ray Diffraction Spectrum

Follow this link to obtain ISOM-UPM application form to access the CT-ISOM (MS-Word format): APPLICATION FORM

Access to: Services offer under Spanish Ministry of Economy and Competitiveness




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